Maximum Precision in the Smallest Spaces

Key challenges of modern high-tech positioning applications include long-term stable positioning, reproducible movements in the nanometer range, a compact design, and flexible configuration for use in small installation spaces. Even the slightest deviation can impair functionality. Therefore, the demands on resolution, stability, and integration capability are high. The B-421 BIX miniature linear stage has been developed to reliably meet these technical requirements.

Advantages at a Glance:
 

• Outstanding precision: Minimum incremental motion of 10 nm
• Stable: Self-locking mechanics for high position stability over long periods of time
• Resilient: High maximum payload and drive force
• Space-saving and flexible: Compact design and stackable for multi-axis combinations
• Precise positioning: High resolution and reproducibility

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The success of modern, high-precision systems depends particularly on the stable positioning of optical components with nanometer precision. In beam manipulation, typical requirements include long-term positioning of mirrors, diaphragms, and lenses, as well as the nanometer-precisealignmentfor reproducible beam steering. There is a demand for compact positioning systems that enable nanometer-precise motion and can be flexibly integrated into multi-axis setups. This is particularly important for beam quality in the semiconductor industry, such as in overlay metrology, and in microscopy for super-resolution microscopy methods like TIRF or STED.